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Generation of chemically amplified resists based on deprotection chemistry. Reproduced from Annu. Rev. Mater. Sci. 1993. Reichmanis, E. and Novembre, A.E., Lithographic Resist Materials Chemistry, 23:11-43. www.annualreviews.org/aronline
For a detailed overview of resist materials and chemistries please consult Materials for Microlithography/Radiation-Sensitive Polymers, Edited by L. F. Thompson, C. G. Willson, and J. M. J. Frechet, ACS Symposium Series 266, 1984, ISBN 0-8412-0871-9. You can find more about novel applications of polymers to the electronics industry under Additional Reading, New Worlds for Polymers (3.4 MB PDF).
We are indebted to Dr. Edwin A. Chandross, Materials Chemistry LLC, for useful discussions and guidance in compiling this summary, and to Dr. Grant Willson from The University of Texas/Austin for photo courtesy.
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